High purity tungsten plating by magnetron sputtering

Magnetic sputtering high -pure tungsten (W) is a common surface treatment technology, which is widely used in the field of electronic industry and material science. Magnetic sputtering is a kind of physical gas deposition technology. By using an inert gas (such as ingot) ion bombardment and an inert gas ion interface, high -purity tungsten material is deposited on the surface of the substrate that needs to be coated. 1. Magnetic sputtering plating: Magnetic sputtering plating is a surface treatment technology. By heating the metal sputter material (such as high pure tungsten) to high temperature, then use the inert gas for sputtering, and the metal material is used as a thin film. The form is deposited on the base surface. Magnetic sputtering plating technology uses magnetic fields to control the movement of ions or neutral particles during the coating process to improve the quality and adhesion of the coating.

2. High -pure tungsten (W): High -purity tungsten is a metal material with excellent heat resistance and corrosion resistance. It is often used in high -temperature processes and electronic devices. High -purity tungsten has a high melting point (3422 ° C), excellent thermal guidance and conductivity, as well as high strength and hardness, so it has excellent performance in harsh environments such as high temperature, high pressure and chemical corrosion.

3. The advantages of magnetic control sputtering high pure tungsten: Magnetic sputtering high -pure tungsten has the following advantages:

-The high -purity tungsten membrane has good stability and adhesion, which can effectively prevent the base materials from being damaged by oxidation, corrosion and wear.

-The high -purity tungsten film has high melting points and thermal conductivity, which can effectively resist thermal corrosion and conduction heat in high temperature environments.

-The high -purity tungsten membrane has good engineering and electronic launch performance, and is suitable for electronic devices and field launch materials.

-C magnetic -controlled sputtering high -pure tungsten process control is more accurate, which can achieve precise control of the thickness, composition and quality of the membrane layer.

4. The application field of magnetic control sputtering high -pure tungsten: Magnetic sputtering high -pure tungsten is widely used in electronics, photoelectric, aerospace and other fields. Specific applications include:

-The conductive layer or electrode material used for electronic devices, such as display, solar cells, semiconductor devices, etc.

-In for vacuum coating materials, it provides anti -corrosion, wear resistance, conductivity and other functions.

-In a field launch material, such as anode material in electronic guns or microwave tubes.

-In for the structural material in high temperature environments, such as aviation engine parts, etc.

It should be noted that high -pure tungsten is a professional and technical field, and many specific process parameters and equipment requirements may also be involved in practical applications. Therefore, in actual operation, we should seek advanced science and technology professional guidance or related knowledge in advanced institutes. Essence