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Magnetron sputtering coating
High purity thulium plating by magnetron sputtering
  • High purity thulium plating by magnetron sputtering

High purity thulium plating by magnetron sputtering


Advanced Institute Technology magnetron sputtering high-purity thulium plating, can customize various specifications as needed; Welcome to inquire.
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0755-22277778


Magnetic sputtering high -plated pure 铥 TM is a common surface treatment technology, which is mainly used in the field of optical film and electronic components.

1. Principles of magnetic control sputtering: Magnetic sputtering is a technology that uses high -speed ions to bombard the surface of the target and make it splash. The principle is to form a plasma by discharging, so that the ions are accelerated and hit the target surface. The atoms or molecules on the target will splash out, and then deposit on the substrate to form a film.

2. Application of high -plated pure 的 TM: Pure 铥 TM is a kind of rare earth metal alloy with excellent magnetic and optical properties, so it has a wide range of applications in many fields. Magnetic sputtering high -plated pure 铥 TM can prepare high -quality pure 铥 TM film for optical film, magnetic storage medium, sensor and other aspects.

3. Key factors for preparing high -quality pure 高 TM film: In the process of magnetic control sputtering high -plated pure 铥 TM, there are several key factors to pay attention to. The first is to choose the right target to ensure that the purity of 铥 TM is high and uniform; the second is to control the process parameters in the sputtering process, such as the air flow, air pressure, target and substrate distance, etc. The thickness and quality of it; finally after the film is processed, if the annealing treatment can improve the tightness and crystallization of the film.

4. Advantages of preparing high -quality pure 高 TM film: Magnetic sputtering high -plated pure 铥 TM thin film has many advantages. First of all, it can prepare a uniform, dense and crystalline pure 铥 TM film; second, the high -energy ion bombardment during sputtering process can increase the combination and adhesion of the film; Efficiency is suitable for substrate materials with large or complex structures.

In short, magnetic control sputtering high -plated pure 铥 TM is a common and effective technology to prepare pure 铥 TM film. Through reasonable selection of target materials, control process parameters, and proper post -processing, you can obtain high -quality pure 铥 铥 film to meet the application needs of different fields.

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0755-22277778
13826586185(Mr.Duan)
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